Process of producing diffraction grating

Details Process of producing diffraction grating Process of producing diffraction grating

1993-12-27

1996-07-30

Breneman, R. Bruce

Etching a substrate: processes

Forming or treating optical article

216 41, 216 47, 216 79, 216 99, 216109, H01L 21308, C03C 1500

Patent

active

055403450

ABSTRACT:
A process of producing a diffraction grating includes the steps of forming a coating layer on a first diffraction grating layer of a resin formed on a substrate without damaging the diffraction grating layer, removing a portion of the coating layer positioned on the first diffraction grating layer by etching to form a second diffraction grating layer of the coating layer having the reverse phase to that of the first diffraction grating layer, removing the first diffraction grating layer, and etching the substrate with a mask of the second diffraction grating layer, so that the diffraction grating having the reverse phase can be easily produced. When the first diffraction grating layer is left and both the first and second diffraction grating layers are used as a mask, the diffraction grating having a period half times as large as that of the first grating layer can be easily produced.

REFERENCES:
patent: 4321282 (1982-03-01), Johnson
patent: 4774164 (1988-09-01), Peavy et al.
patent: 4792197 (1988-12-01), Inoue et al.
patent: 4806442 (1989-02-01), Shirashi et al.
patent: 4806454 (1989-02-01), Yoshida et al.
patent: 4826291 (1989-05-01), Utaka et al.
Fabrication of First-order Grating for 1.5 .mu.m DFB Laser By High Voltage Electron-Beam Lithography (Electronics Letters vol. 23, 11 pp. 590-592).
.gamma./4-Shifted DFB-LD Corrugation Formed by a Novel Spatial Phase Modulating Mask (Tech Digest of IOOC-ECOC '85 pp. 25-28).
.gamma./4-Shifted InGaAsP/InP DFB Lasers By Simultaneous Holographic Exposure of Positive and Negative Photoresists (Electronics Letters vol. 20, No. 24 pp. 1008-1010).

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