Process of patterning conductive layer into electrode through li

Details Process of patterning conductive layer into electrode through li Process of patterning conductive layer into electrode through li

1997-09-18

2000-12-19

Chaudhuri, Olik

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438665, 438951, 438609, H01L 2144

Patent

active

061627259

ABSTRACT:
Transparent electrodes of a plasma display panel is patterned from a transparent conductive layer by using a lift-off technique; a photo-resist mask is roughened through exposure to oxygen plasma before the deposition of the transparent conductive layer, and the rough surface causes the photo-resist mask to be partially uncovered with the transparent conductive layer, thereby allowing photo-resist remover to rapidly penetrate into the boundary between the photo-resist mask and a glass substrate.

REFERENCES:
patent: 4642163 (1987-02-01), Greschner et al.

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