Process of obtaining improved contrast in electron beam lithogra

Details Process of obtaining improved contrast in electron beam lithogra Process of obtaining improved contrast in electron beam lithogra

1989-07-14

1990-06-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430302, 430325, 430331, G03C 534, G03C 524

Patent

active

049371746

ABSTRACT:
An improved developer for PMMA, electron resist comprising an effective amount of MEK in combination with MIBK or CS alone or a mixture thereof and a process of obtaining improved contrast in electron beam lithography therewith.

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patent: 4348471 (1982-09-01), Shelnut et al.
patent: 4350753 (1982-09-01), Shelnut et al.
patent: 4476217 (1984-10-01), Douglas et al.
patent: 4551387 (1985-11-01), Manabe et al.
Harada et al., "Detailed Contrast Measurements . . . ", Solid State Science and Technology, vol. 129, No. 11, Nov. 1982, pp. 2576-2578.
Taylor, Gary, "Guidelines for Publication . . . ," Solid State Technology, Jun. 1984, pp. 105-110.
Craighead, H. G., "Ultra-High Resolution . . . ," Journal of Electron Microscopy Technique, 2:147-155 (1985).
Mackie et al., "Materials and Processes for Nanometer Lithography", Solid State Technology, 8/85, pp. 117-122.

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