Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent
1995-08-04
1996-12-31
Tung, T.
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
7333502, 204430, 205788, 216 66, 216 75, 427125, C23F 102, G01N 2726
Patent
active
055890857
ABSTRACT:
A new design for and an improved process of manufacturing a detecting unit for a type I electrolytic cell with thin film electrodes. In the first step of the process, a long, narrow, transparent, hollow glass tube is provided having an inside surface, an outside surface, and an end with a rim. A thin, noble metal film is deposited on the inside surface of the hollow glass tube. Then, a beam from a light source is directed through the hollow glass tube to remove a first portion of the noble metal film from the inside surface of the hollow glass tube and create a first spacer area. The beam also removes a second portion of the noble metal film from the inside surface of the hollow glass tube and creates a second spacer area. Consequently, two, separate electrode wires are created. Finally, an hygroscopic film is deposited on the entire inside surface of the hollow glass tube, covering completely the first and second electrode wires and the spacer areas. The detecting unit thus manufactured has a long, narrow, transparent, hollow glass tube; first and second thin, flat, noble metal, film electrodes deposited on the inside surface of the glass tube and separated by spacer areas; and an hygroscopic film deposited on the entire inside surface of the glass tube, covering completely the first and second electrodes and the spacer areas.
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Meeco, Incorporated
Tung T.
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