Process of making semiconductor devices using photosensitive bod

Details Process of making semiconductor devices using photosensitive bod Process of making semiconductor devices using photosensitive bod

1981-05-22

1983-08-23

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

20415914, 20415922, 430270, 430272, 430313, 430320, G03C 500

Patent

active

044004613

ABSTRACT:
Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o-nitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

REFERENCES:
patent: 3849137 (1974-11-01), Barzynski et al.
patent: 3949143 (1976-04-01), Schlesinger
patent: 4131465 (1978-12-01), Petropoulos
patent: 4150989 (1979-04-01), Chambers et al.

Affiliated with

Also associated with

Rating

Process of making semiconductor devices using photosensitive bod does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of making semiconductor devices using photosensitive bod, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of making semiconductor devices using photosensitive bod will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1947656