Process of imaging using an indanone containing material

Details Process of imaging using an indanone containing material Process of imaging using an indanone containing material

1981-05-01

1982-12-14

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

20415922, 430270, 430272, 430311, 430313, G03C 168

Patent

active

043638678

ABSTRACT:
The use of polymers including an indanone entity for use as a resist in a photosensitive body used in a lithographic process leads to desirable results. These resists have excellent resolution essentially equivalent to that obtainable with poly(methyl methacrylate). Additionally, the sensitivities of these polymers to the actinic radiation typically used in photolithographic processes, e.g., radiation from a mercury lamp, is significantly better than that obtained with poly(methyl methacrylate).

REFERENCES:
patent: 3959234 (1976-05-01), Kurosawa et al.
patent: 4297433 (1981-10-01), Tsuda et al.
patent: 4302529 (1981-11-01), Cai
patent: 4304840 (1981-12-01), Helbert et al.

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