Process of forming ultrafine pattern

Details Process of forming ultrafine pattern Process of forming ultrafine pattern

1985-11-08

1986-12-02

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156635, 156643, 156646, 156653, 156656, 156657, 156662, 1566591, 2041923, 219121EM, 219121LM, 2504921.492.2, 2504923, 427 35, 427 431, 427 531, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

046263152

ABSTRACT:
A process for forming an ultrafine pattern on a surface of a substrate, which includes steps of irradiating the substrate surface with radiation modulated according to information to be patterned, subjecting the substrate surface to deposition with a material reactive or not with the substrate, and subjecting the substrate surface to etching if a substrate-reactive material is used for deposition. By this process, an ultrafine pattern can easily be formed with a high accuracy.

REFERENCES:
patent: 4319954 (1982-03-01), White et al.
patent: 4530734 (1985-07-01), Klima

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