Process of forming a photoresist pattern and apparatus for corre

Details Process of forming a photoresist pattern and apparatus for corre Process of forming a photoresist pattern and apparatus for corre

1984-08-21

1986-11-18

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430325, 430331, 430394, 427140, G03C 500

Patent

active

046236074

ABSTRACT:
A process of forming a photoresist pattern and apparatus for correcting the pattern is for correcting defects in a photoresist pattern after the pattern is formed. In this process, after the photoresist pattern is formed, defects in the pattern is detected. For negative type defects photoresist material is selectively dropped onto the defects to coat them with the material and for positive type defects light is selectively irradiated through light shielding masks onto the defects, which are then developed to remove the defects.
The apparatus includes a photoresist coating device which discharges photoresist material utilizing piezo-electric effect.

REFERENCES:
patent: 3317320 (1967-05-01), Reber
patent: 3748975 (1973-07-01), Tarabocchia
patent: 3843362 (1974-10-01), Di Fazio et al.

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