Process of fabricating an enlongated microstructure element on a

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437228, B44C 122

Patent

active

054395526

ABSTRACT:
The invention concerns a fabrication process of at least one generally elated structural element (14) on a substrate (12) in a first material and having a substantially flat upper face (13), said element (14) realized in a second material comprising at least a first wing (14a) parallel to a plan perpendicular to said upper face (13).

REFERENCES:
patent: 3539705 (1970-11-01), Nathanson et al.
patent: 3620932 (1971-11-01), Crishal
patent: 3796976 (1974-03-01), Heng et al.
patent: 4624741 (1986-11-01), Daniele
patent: 4674180 (1987-06-01), Zavracky et al.
patent: 4744863 (1988-05-01), Guckel et al.
patent: 4783237 (1988-11-01), Aine et al.
patent: 4849070 (1989-07-01), Bly et al.
patent: 4959515 (1990-09-01), Zavracky et al.
patent: 4997521 (1991-03-01), Howe et al.
patent: 5068203 (1991-11-01), Logsdon et al.
patent: 5262000 (1993-11-01), Welbourn et al.
patent: 5266531 (1993-11-01), Kikinis

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process of fabricating an enlongated microstructure element on a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of fabricating an enlongated microstructure element on a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of fabricating an enlongated microstructure element on a will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-968900

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.