Process of exposing and developing terpolymer photosensitive bod

Details Process of exposing and developing terpolymer photosensitive bod Process of exposing and developing terpolymer photosensitive bod

1981-02-19

1982-08-10

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430270, 430302, 20415922, G03C 500

Patent

active

043438890

ABSTRACT:
A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.

REFERENCES:
patent: 3558311 (1971-01-01), Delzenne et al.
patent: 4233394 (1980-11-01), Helbert
patent: 4279984 (1981-07-01), Matsuda et al.
Reichmanis et al., Journal of The Electrochemical Society, vol. 127, pp. 2514-2517 (1980).

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