Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Including heating
Patent
1995-12-13
1998-06-09
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Including heating
430 5, 430313, G03C 500
Patent
active
057631433
ABSTRACT:
Tension takes place in a surface of a photo-resist mask due to a shrinkage in a post-development bake, and a recess formed in the photo-resist mask takes up the tension so as to maintain the adhesion to a semiconductor substrate and prevent a resist pattern from undesirable deformation.
REFERENCES:
patent: 5032890 (1991-07-01), Ushiku et al.
patent: 5459093 (1995-10-01), Kuroda et al.
Chapman Mark
NEC Corporation
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