Process of etching a titanium/tungsten surface and etchant...

Details Process of etching a titanium/tungsten surface and etchant... Process of etching a titanium/tungsten surface and etchant...

2006-11-28

2008-09-16

Tran, Binh X (Department: 1792)

Etching a substrate: processes

Nongaseous phase etching of substrate

Relative movement between the substrate and a confined pool...

C216S100000, C216S108000, C438S754000

Reexamination Certificate

active

07425278

ABSTRACT:
An etchant which includes an aqueous solution of between about 30% and about 38% concentrated hydrogen peroxide, said percentages being by volume, based on the total volume of the solution; between about 3.5 ml and about 20 ml per liter of phosphoric acid; and an amount of potassium hydroxide to adjust the pH of the solution to between about 7.8 and about 9.1. The etchant is useful in removing a layer of an alloy of titanium and tungsten or a layer of tungsten from a precision surface.

REFERENCES:
patent: 4554050 (1985-11-01), Minford et al.
patent: 4671852 (1987-06-01), Pyke
patent: 4814293 (1989-03-01), Van Oekel
patent: 5211807 (1993-05-01), Yee
patent: 5462638 (1995-10-01), Datta et al.
patent: 5517080 (1996-05-01), Budzilek et al.
patent: 6365482 (2002-04-01), Maghsoudnia
patent: 6379577 (2002-04-01), Akatsu et al.
patent: 5136119 (1993-06-01), None
patent: 11054474 (1999-02-01), None

Affiliated with

Also associated with

Rating

Process of etching a titanium/tungsten surface and etchant... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of etching a titanium/tungsten surface and etchant..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of etching a titanium/tungsten surface and etchant... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3984655