Process of developing a negative-working radiation-sensitive pho

Details Process of developing a negative-working radiation-sensitive pho Process of developing a negative-working radiation-sensitive pho

1993-01-25

1993-10-05

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Readily visible image formation

430167, 430196, 430197, 430286, G03F 730, G03F 7012, G03C 1695

Patent

active

052503925

ABSTRACT:
A negative-working, radiation-sensitive composition comprising an admixture in a solvent of:

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patent: 4467025 (1984-08-01), Goto et al.
patent: 4575480 (1986-03-01), Kotani et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4677043 (1987-06-01), Cordes, III et al.
patent: 4789619 (1988-12-01), Ruckert et al.
Housley et al. "Dyes in Photoresists: Today's View", Semiconductor International, Apr. 1988, pp. 142-144.

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