Process of depositing thin film coatings

Details Process of depositing thin film coatings Process of depositing thin film coatings

1996-06-06

1997-05-20

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

4272481, 427294, 427569, 427585, 427595, H05H 102

Patent

active

056310501

ABSTRACT:
A process of depositing thin film coatings by evaporation in which a plasma is formed in an evacuated chamber and a source of material to be evaporated is provided which is evaporated to produce evaporated material. A substrate to be coated is located within the chamber and the evaporated material is caused to pass through the plasma and be to be deposited on the substrate. The plasma is generated by a helicon wave.

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