Process of depositing diamond-like thin film by cathode sputteri

Details Process of depositing diamond-like thin film by cathode sputteri Process of depositing diamond-like thin film by cathode sputteri

1987-03-02

1988-08-30

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, C23C 1434

Patent

active

047675179

ABSTRACT:
The present invention relates to a diamond-like thin film and a method of making the diamond-like thin film comprises causing sputtering by applying an electric power under a limited hydrogen pressure within a sputtering apparatus having a graphite target and forming on a substrate the diamond-like thin film composed an accumulation of particles of several nm to several 100 nm and having its surface enclosed with alkyl radicals whose carbon number is 3 or less and its interior provided with a diamond structure of a four coordinated carbon arrangement.

REFERENCES:
patent: 3317354 (1967-05-01), Darrow et al.
patent: 3361659 (1968-01-01), Bertelsen
patent: 3840451 (1974-10-01), Golyamov et al.
patent: 3961103 (1976-06-01), Aisenberg
patent: 4395323 (1983-07-01), Denton et al.
patent: 4437962 (1984-03-01), Banks
patent: 4504519 (1985-03-01), Zelez
Aisenberg, S. and Chabot, R., "Ion-Beam Deposition of Thin Films of Diamondlike Carbon", Journal of Applied Physics, vol. 42, No. 7, Jun. 1971, pp. 2953-2958.
Spencer, E., et al., "Ion-Beam-Deposited Polycrystalline Diamondlike Films", Applied Physics, vol. 29, No. 2 Jul. 1976, pp. 118-120.

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