Process monitoring system, process monitoring method, and...

Details Process monitoring system, process monitoring method, and... Process monitoring system, process monitoring method, and...

2008-03-25

2008-03-25

Punnoose, Roy M (Department: 2886)

Optics: measuring and testing

By polarized light examination

C356S369000

Reexamination Certificate

active

11882275

ABSTRACT:
A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.

REFERENCES:
patent: 5408322 (1995-04-01), Hsu et al.
patent: 6034777 (2000-03-01), Johs et al.
patent: 2002-93870 (2002-03-01), None
U.S. Patent Application for Takayuki Sakai et al., U.S. Appl. No. 10/395,065, filed Mar. 25, 2003.

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