Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2007-01-02
2007-01-02
Picard, Leo (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C700S110000, C438S009000
Reexamination Certificate
active
11356099
ABSTRACT:
A plasma processing apparatus for processing a sample within a vacuum vessel, including: a plurality of sensors for detecting plural kinds of information relating to a processing state of the sample as monitor data; data selecting means for selecting a detection time range of the monitor data thus detected which is used for monitoring the plasma processing apparatus; a signal filter for converting the monitor data within the selected detection time range into an effective signal; a model expression unit for generating a predicted value of a patterned physical-shape of a sample based on the effective signal; and a display screen for displaying the patterned physical-shape predicted value; wherein the display screen displays the patterned physical-shape predicted value without measuring a patterned shape after processing of the sample.
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Ikuhara Shoji
Kitsunai Hiroyuki
Takahashi Kazue
Tanaka Junichi
Yamamoto Hideyuki
Antonelli, Terry Stout and Kraus, LLP.
Hitachi , Ltd.
Kosowski Alexander
Picard Leo
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