Process monitor and system for producing semiconductor

Details Process monitor and system for producing semiconductor Process monitor and system for producing semiconductor

2007-12-04

2007-12-04

Lebentritt, Michael (Department: 2812)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S005000, C438S014000, C438S016000, C257SE21521

Reexamination Certificate

active

10532991

ABSTRACT:
A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operation time or an operation timing, etc. Furthermore, unauthorized use is prevented by storing a keyword in an ROM of the process monitor.

REFERENCES:
patent: 5444637 (1995-08-01), Smesny et al.
patent: 6102284 (2000-08-01), Myers et al.
patent: 6288561 (2001-09-01), Leedy
patent: 6576922 (2003-06-01), Ma et al.
patent: 6607965 (2003-08-01), Moradi et al.
patent: 6614051 (2003-09-01), Ma
patent: 6773158 (2004-08-01), Koshimizu
patent: 2004/0007326 (2004-01-01), Roche et al.
patent: 06-76193 (1994-03-01), None
patent: 2001-242014 (2001-09-01), None
patent: 2002-170925 (2002-06-01), None
patent: WO 00/68986 (2000-11-01), None

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