Process kit for substrate processing chamber

Details Process kit for substrate processing chamber Process kit for substrate processing chamber

2011-07-19

2011-07-19

McDonald, Rodney G (Department: 1724)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C118S720000, C118S721000

Reexamination Certificate

active

07981262

ABSTRACT:
A process kit comprises a shield and ring assembly positioned about a substrate support in a processing chamber to reduce deposition of process deposits on internal chamber components and an overhang edge of the substrate. The shield comprises a cylindrical band having a top wall that surrounds a sputtering target and a bottom wall that surrounds the substrate support, a support ledge, a sloped step, and a U-shaped channel with gas conductance holes. The ring assembly comprises a deposition ring and cover ring, the cover ring having a bulb-shaped protuberance about the periphery of the ring.

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