Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Having substrate registration feature
Patent
1997-01-13
1998-12-01
Bowers, Charles
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Having substrate registration feature
438462, H01L 2176
Patent
active
058438319
ABSTRACT:
A method is disclosed for aligning wafers independent of the processes to which a wafer is subjected. In prior art, it is found that when aligning wafers from the front or device side, the alignment of the masks vary because of the variations on the topography of the particular layer in process. Since the topography of a layer is influenced by the planarization processes used and by the cumulative effect of the number of underlying features that are disposed on top of each other, severe misalignments can occur causing defective parts. The problem is eliminated by forming alignment marks on the backside of the wafer, and performing alignment with respect to the backside marks by projecting IR energy through an IR transparent stage placed under the backside of the wafer and using an IR microscope. An alignment system capable of performing process independent alignment is also disclosed.
REFERENCES:
patent: 3752589 (1973-08-01), Kobayashi
patent: 4046985 (1977-09-01), Gates
patent: 4131487 (1978-12-01), Pearce et al.
patent: 4534804 (1985-08-01), Cade
patent: 4970587 (1990-11-01), Abe
patent: 4996763 (1991-03-01), Sano et al.
patent: 5034684 (1991-07-01), Mitsui et al.
patent: 5189502 (1993-02-01), Gomi
patent: 5200798 (1993-04-01), Katagiri et al.
patent: 5408320 (1995-04-01), Katagiri et al.
S. Wolf, "Silicon Processing For The VLSI Era-vol. 2" Lattice Press, Sunset Beach, CA, p. 203, p. 476.
S. Wolf "Silicon Processing for the VLSI Era vol. 3--The submicron MOSFET", p. 373. Lattice Press, Sunset Beach, CA, USA, 1995.
Chung Wen-Jye
Jang Bor-Ping
Wei Chih-Shih
Ackerman Stephen B.
Bowers Charles
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
Thompson Craig
LandOfFree
Process independent alignment system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process independent alignment system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process independent alignment system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2395388