Process gas delivery system for CVD having a cleaning subsystem

Details Process gas delivery system for CVD having a cleaning subsystem Process gas delivery system for CVD having a cleaning subsystem

1998-04-22

2000-03-07

Cano, Milton

Coating apparatus

Control means responsive to a randomly occurring sensed...

Responsive to condition of coating material

118715, 118726, 134 221, 134 2211, 134 2212, B08B 902

Patent

active

060334797

ABSTRACT:
A process gas delivery system incorporating a cleaning solution delivery subsystem for chemical vapor deposition. The system includes a slanted cleaning solution feed pipe for introducing a cleaning solution into the process gas delivery system and for disposal of waste cleaning solution from the process gas delivery system. Automatic determination of maintenance time may be accomplished by using an optical sensor provided on the process gas delivery pipe that detects the accumulation of the deposition material within the piping. The sensor may also be used to detect the cleaning solution residue inside the piping after cleaning and the liquid level during deposition.

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Search Report from Yoshida Kanayama Ishida & Associates dated Jul. 9, 1997.

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