Process gas delivery system

Details Process gas delivery system Process gas delivery system

1996-02-08

1997-06-24

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 156345, C23C 1600

Patent

active

056413599

ABSTRACT:
A system for extending the tuning ranges of various parameters that control plasma ignition within a process chamber effectively reduces the RF power level necessary for plasma ignition within the process chamber. A central conductor is coaxially disposed within a conduit that conveys a process gas to the process chamber. The process gas is energized within the conduit by application of an RF power source thereto. In particular, process gas molecules flowing through the conduit are excited by the RF power which is coupled to the central conductor. The excited process gas is then injected into the process chamber. An RF or microwave power source is supplied to the process chamber using conventional techniques to stimulate the excited gas and thereby ignite a plasma therein.

REFERENCES:
patent: 4339326 (1982-07-01), Hirose
patent: 4568437 (1986-02-01), Dickson
patent: 4616597 (1986-10-01), Kaganowicz
patent: 5324362 (1994-06-01), Schneider
patent: 5494522 (1996-02-01), Moriya

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