Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1981-04-13
1982-09-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 5, 430 8, 430320, 430321, 430325, 430966, 430967, 428610, 378 35, G03C 504, B05D 306, G21K 100
Patent
active
043496210
ABSTRACT:
A process for X-ray microlithography useful in the manufacture of microelectronic devices is provided. In the process, a mask in the form of a thin film of a eutectic is interposed between a source of X-rays and a substrate to selectively expose a layer of X-ray sensitive resist situate on the surface of the substrate. After exposure, the resist is developed to yield in the resist a replica of the submicron minimum feature size pattern of the mask.
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Albers et al., "Aligned Eutectics, Thin Film Growth", J. of Crystal Growth, vol. 18, pp. 147-150, 1973.
Arakawa et al., "Soft X-Ray Transmission Gratings", SPIE, vol. 240, 1980, pp. 52-55.
Tischer, P., "Advances in X-Ray Lithography", Eurocon '80, Stuttgart, Germany, 3/1980, pp. 46-51.
Brewer, G. R. (Editor), "Electron Beam Technology in Micro-electronic Fabrication"--Chapter 1 (pp. 1-58), Academic Press Inc., 1980.
Gudat, W., "Soft X-Ray Microscopy and Lithography with Synchrotron Radiation", Nuc. Ins. and Methods, 152, pp. 279-288, 1978.
Bowers Jr. Charles L.
Cohen Joseph T.
Davis Jr. James C.
General Electric Company
Strunck Stephen S.
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