Process for ultradrying of a gas

Chemistry of inorganic compounds – Halogen or compound thereof – Hydrogen halide

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Details

423210, B01D 5302, B01D 5328, C01B 707

Patent

active

049331620

ABSTRACT:
The invention concerns a process for ultra-drying of a gas or gas mixture by bringing this into contact with a silicate containing material.
In order to obtain a residual water level of 5 ppb or less, the invention is characterized in that the gas or gas mixture is brought into contact with a silcate containing material, preferably a zeolite or silicagel, that has been modified with silane, borane, and/or the alkyl and/or halogen substituted compounds thereof.
The invention is further concerned with the separation of tritium oxide from gas mixtures preferably with water.

REFERENCES:
patent: 3533220 (1970-10-01), Espagno et al.
patent: 3536521 (1970-10-01), McKinney et al.
patent: 4178350 (1979-12-01), Collins et al.
patent: 4414005 (1983-11-01), De Bievre et al.
patent: 4620857 (1986-11-01), Vansant et al.

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