Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Reexamination Certificate
2007-09-04
2007-09-04
Olsen, Allan (Department: 1763)
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
C134S021000, C134S022100, C216S037000, C216S076000, C216S077000
Reexamination Certificate
active
11252786
ABSTRACT:
Ruthenium, osmium and their oxides can be etched simply and rapidly by supplying an atomic oxygen-donating gas, typically ozone, to the aforementioned metals and their oxides through catalysis between the metals and their oxides, and the ozone without any damages to wafers and reactors and application of the catalysis not only to the etching but also to chamber cleaning ensures stable operation of reactors and production of high quality devices.
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Arai Toshiyuki
Nakahara Miwako
Ohno Shigeru
Tsunekawa Sukeyoshi
Watanabe Kazuto
Olsen Allan
Renesas Technology Corp.
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