Process for treating semiconductor material with an acid-contain

Details Process for treating semiconductor material with an acid-contain Process for treating semiconductor material with an acid-contain

1995-04-10

1996-12-24

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

252 792, 252 793, H01L 2100

Patent

active

055870465

ABSTRACT:
A process for treating semiconductor material with an acid-containing fluid, has water being formed as a product of a chemical reaction. Before and/or during the treatment of the semiconductor material, phosphorus pentoxide is added to the acid-containing fluid.

REFERENCES:
patent: 3923567 (1975-12-01), Lawrence
patent: 3971683 (1976-07-01), Briska et al.
Patent Abstracts of Japan JP-A-55154452.
Derwent Abstract of JP-A-55154452.

Affiliated with

Also associated with

Rating

Process for treating semiconductor material with an acid-contain does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for treating semiconductor material with an acid-contain, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for treating semiconductor material with an acid-contain will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1176453