Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1993-08-30
1995-08-22
Padgett, Marianne
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427529, 427533, 427102, 4271263, B05D 306, B05D 512
Patent
active
054438624
ABSTRACT:
A method is provided for generating one or more differentiated zones of electrical conductivity or infrared emissivity in a thin semi-conducting layer of metallic oxide or oxides, comprising:
REFERENCES:
patent: 3887349 (1975-06-01), Akashi et al.
patent: 3907660 (1975-09-01), Gillery
patent: 4088799 (1978-05-01), Kurtin
patent: 4102768 (1978-07-01), Kearin et al.
patent: 4116806 (1978-09-01), Love et al.
patent: 4166018 (1979-08-01), Chapin
patent: 4172159 (1979-10-01), Marcault
patent: 4395467 (1983-07-01), Vossen, Jr. et al.
patent: 4500567 (1985-02-01), Kato et al.
patent: 4686162 (1987-08-01), Stangl et al.
patent: 4694091 (1987-09-01), Kerherve et al.
patent: 4707383 (1987-11-01), Mattes et al.
patent: 4859499 (1989-08-01), Sauvinet et al.
patent: 4873118 (1989-10-01), Elias et al.
patent: 4888202 (1989-12-01), Murakami et al.
patent: 5011580 (1991-04-01), Brochot et al.
patent: 5087322 (1992-02-01), Lillienfeld et al.
Translation of Japanese reference 61-246,361 & Toray, Ind. Inc. pub. Nov. 1, 1986.
Thin Solid Films, vol. 11, 1972, pp. 1-26, P. T. Stroud, "Ion Bombardment and Implantation and Their Application to Thin Films" No month.
Materials Research Society Symposium Proceedings, vol. 27, 1984, pp. 765-770, "Recoil Implantation of Ito Thin Films on Glass Substrates", B. H. Rabin, et al. No month.
Bonding sheet materials together--by bringing sheets into composite assembly and heating to temp, such that one of sheets adheres to the adjacent sheet, Derwent, English language abstract of EP-385769 A No date given.
Metal oxide film deposn on glass strip--by pyrolytic decompsn of spryaed-on metal cpds, Derwent English language abstract of FR2211411, U.S. equivalent 3,887,349, is attached No date.
Deposition of tin oxide on substrates--using butyl tin tri:chloride as source, with dopant, Derwent, English language abstract of EP-121459, U.S. equivalent 4,500,567, is attached No date.
Electrically conducting films formed on glass substrates by CVD--where gaseous organofluoro cpd. added to metal vapour produces films with very low resistivity, Derwent, English language abstract of EP-27403 French No date given.
Infrared relecting coating of doped tin oxide for glass--obtd. by pyrolysis or organic tin and halogen cpds., esp. organic tin:flourine cpds., English language abstract of EP-39256, U.S. equivalent 4,707,383, is attached No date.
Prepn. of di:butyl tin di:fluoride--by reacting a tin halide cpd. with ammonium fluoride in absence of alkali(ne earth) metal cpds., Derwent, English language abstract of EP-178956, U.S. equivalent 4,694,091, attached No date.
Semi-reflecting glass pane reducing transmission of infrared rays where pane has inexpensive coating of tin oxide (BE 16.8.78), Derwent, English language abstract of FR2380997, U.S. equivalent 4,172,159, is attached No date.
Prodn. of thin transparent conducting metal oxide films on glass--by pyrolysis of powdered indium formate and tin cpds. then heat treatment in reactive atoms., Derwent, English language abstract of EP 397292 French No date.
Cathodic sputtering appts.--using electromagnet to provide curved magnetic field in discharge region, Derwent, English Abstract of DE2463431, U.S. equivalent 4,166,018 attached No dates given.
Depositing metallic oxide coatings--partic transparent electrically conductive coatings on non-conductive substrates, Derwent, English language abstract of FR2208005, U.S. equivalent 4,102,768, is attached Kerin et al No date given.
Buffat Bernard
Lerbet Francois
Pillias Daniele
Padgett Marianne
Saint-Gobain Vitrage International
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