Process for the silylation of inorganic oxides

Details Process for the silylation of inorganic oxides Process for the silylation of inorganic oxides

1995-05-16

1997-11-11

Langel, Wayne

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423592, 423610, 423625, 423659, C01B 3312, C01F 702, C01G 23047

Patent

active

056860544

ABSTRACT:
The invention relates to a process for the silylation of very finely divided inorganic oxides, in which the very finely divided inorganic oxides are treated with at least one silylating agent which is relatively nonvolatile in the temperature range of the overall process, with the proviso that the relatively nonvolatile silylating agent is admixed with the very finely divided inorganic oxides as a liquid, in the form of a very finely atomized aerosol. Furthermore, the invention relates to a highly apolar, pyrogenic silica prepared by this process.

REFERENCES:
patent: 3830738 (1974-08-01), Cottrell
patent: 3963627 (1976-06-01), Cottrell
patent: 4015031 (1977-03-01), Reinhardt et al.
patent: 4036933 (1977-07-01), Laufer et al.
patent: 4108964 (1978-08-01), Kratel et al.
patent: 4902570 (1990-02-01), Heinemann et al.
patent: 5153030 (1992-10-01), Chatfield et al.
patent: 5277888 (1994-01-01), Baron et al.
patent: 5366938 (1994-11-01), Deller et al.
patent: 5614177 (1997-03-01), Persello
English Derwent abstract AN 94-008697/02.
English Derwent abstract AN 75-17818W/11.
English Derwent abstract AN 71-55550S/34.
English Derwent Abstract AN 83-777868/40.
English Derwent abstract AN 70-71764R/39.
English Derwent abstract AN 76-77771X/42.
English Derwent abstract AN 75-55793W/34.
English Derwent abstract AN 79-06170B/04.
English Derwent abstract AN 72-36420T/23.
George W. Sears "Determination of Specific Surface Area of Colloidal Silica by Titration with Sodium Hydroxide", Anal.Chem. 1956, 12, 1981.
Patent Abstracts of Japan JP 6016971.
English Derwent Abstract AN 71-76767S/49.
Sworn English Translation of EP 0 579 049.

Affiliated with

Also associated with

Rating

Process for the silylation of inorganic oxides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the silylation of inorganic oxides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the silylation of inorganic oxides will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1226437