Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1978-11-15
1980-10-28
Silverberg, Sam
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430935, 427 96, 427420, G03C 500
Patent
active
042307937
ABSTRACT:
A process for producing solder masks on double sided printed circuit boards, comprising conveying the boards beneath a free falling curtain of a pohotopolymer to form a thin layer on a surface of the board, irradiating with ultra violet light areas of the surface other than those that need to be soldered and then, by subsequent development, dissolving the unirradiated areas of the layer. The viscosity of the photopolymer is between 500 to 1200 mPa's at impingement on the surface of the circuit and the height of the curtain is selected so that the rate of flow of the polymer onto the circuit is between 60 to 160 m/min. Also the rate at which the circuits are conveyed beneath the curtain is greater than a rate slightly less than the rate at which the polymer flows onto the circuit.
REFERENCES:
patent: T857041 (1968-12-01), Eells
patent: 2963002 (1960-12-01), Glaus
patent: 3132968 (1964-05-01), Wandtke
patent: 3205089 (1965-09-01), Kinzelman
patent: 3500610 (1970-03-01), Chenoweth
patent: 3876465 (1975-04-01), Prazak
patent: 4018940 (1977-04-01), Morgan
patent: 4064287 (1977-12-01), Lipson
patent: 4150169 (1979-04-01), Bagley
patent: 4153855 (1979-05-01), Feingold
Losert Ewald
Rembold Heinz
Ciba-Geigy Corporation
Falber Harry
Silverberg Sam
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