Process for the production of light microguides with low optical

Details Process for the production of light microguides with low optical Process for the production of light microguides with low optical

1988-12-20

1990-05-29

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, 156662, 20419223, 20419226, 20419228, 350 9612, 427167, 437240, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

049293028

ABSTRACT:
Process for the production of light microguides with low optical propagation losses by multilayer deposition comprises, deposited in this order on a substrate, a first layer of index n, a second guide layer of index n+.DELTA.n.sub.1 and a third layer covering the two first-mentioned layers and of index n+.DELTA.n.sub.2. The second guide layer is deposited in two successive stages comprising: a first deposition stage followed by a partial etching of a first intermediate layer through an appropriate mask, in such a way that the unmasked part of the first intermediate layer has a thickness, counted from the interface located between the first layer and the first intermediate layer, equal to h, and a second deposition stage of a second intermediate layer of a material having the same index n+.DELTA.n.sub.1 as the preceding intermediate layer and surmounting the latter by a height h'.

REFERENCES:
Patent Abstracts of Japan, vol. 11, No. 87, p. 557, 2534, 17.3.1987; JP-A-61 240 207 (NEC Corp.) 25.10.1986.

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