Process for the production of etched structures in a surface of

Details Process for the production of etched structures in a surface of Process for the production of etched structures in a surface of

1976-07-16

1978-05-30

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 156657, 156661, 204192E, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

040922103

ABSTRACT:
A process for producing an etched structure in a surface of a solid body by providing a mask on the surface of the solid body to expose the desired portions of the surface, ionic etching the mask and the exposed surface with the material of the mask and the material of the solid body being disintegrated and removed by the ion bombardment of the ionic etching characterized by the disintegration rate of the mask being changed during the ionic etching step. In one embodiment of the process the mask is composed of at least two layers having different disintegration rates with the layer having the highest disintegration rate being disposed adjacent the surface and the layer with the lower disintegration being disposed thereon. In another embodiment of the invention, the mask comprises a single layer of material, such as metal, and the rate of disintegration of the masking layer is changed by adding a reactive gas during a portion of the ionic etching step.

REFERENCES:
patent: 3880684 (1975-04-01), Abe
patent: 3975252 (1976-08-01), Fraser et al.
patent: 3984300 (1976-10-01), Van Ommeren
patent: 3986912 (1976-10-01), Alcorn et al.

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