Process for the production of dielectric layers in planar circui

Details Process for the production of dielectric layers in planar circui Process for the production of dielectric layers in planar circui

1989-06-16

1992-03-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430198, 430330, G03C 500

Patent

active

050988158

ABSTRACT:
Apertures with inclined sidewalls are produced in a dielectric layer by exposing a photoformable dielectric layer through a mask having a section without a sharp line of demarcation between opaque and transparent areas.

REFERENCES:
patent: 4912022 (1990-03-01), Urquhart et al.
Watanabe et al., "Thick Film Fine Pattern Formation . . . ", Conf: Proceedings 29th Electronic Component Conf., N.J., May 1979.

Affiliated with

Also associated with

Rating

Process for the production of dielectric layers in planar circui does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the production of dielectric layers in planar circui, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the production of dielectric layers in planar circui will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2009563