Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-05-19
1990-04-24
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419226, 65106, C23C 1434
Patent
active
049197789
ABSTRACT:
A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.
REFERENCES:
patent: Re25711 (1965-01-01), Gaiser
patent: 4337990 (1982-07-01), Fan et al.
patent: 4497700 (1985-02-01), Groth et al.
patent: 4548691 (1985-10-01), Dietrich et al.
patent: 4650557 (1987-03-01), Bitter
Dietrich Anton
Hartig Klaus
Szczyrbowski Joachim
Leybold-Heraeus GmbH
Nguyen Nam X.
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