Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1987-01-07
1989-08-15
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 427 64, 313309, C23C 1400, B05D 506
Patent
active
048571610
ABSTRACT:
A process of producing a display operating by cathodoluminescence excited by field emission, including forming parallel cathodes on a glass substrate, depositing a silica coating on the cathodes, then a conductive coating and then producing a matrix of holes in the conductive coating and silica coating, depositing on the perforated conductive coating a fourth coating not covering the holes and then depositing on the complete structure a coating of an electron emitting material, eliminating the fourth coating so as to expose the microemitters, forming in the conductive coating grids crossing the cathodes and placing above the grids an anode covered by a cathodoluminescent coating.
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Spindt, C. A. "A Thin-Film Field-Emission Cathode" J. Applied Physics vol. 39, No. 7 (1968) pp. 3504-3505.
Borel Michel
Boronat Jean-Francois
Meyer Robert
Rambaud Philippe
Commissariat a l''Energie Atomique
Marquis Steven P.
Niebling John F.
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