Process for the positioning of an interconnection line on an ele

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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29591, 156644, 156646, 156653, 156656, 156657, 1566591, 1566611, 156904, 204192E, 357 65, 427 38, 427 88, 430317, 430318, C23F 102, B44C 122, C03C 1500, C03C 2506

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045418926

ABSTRACT:
An improvement to the process for positioning an interconnection line on an electrical contact hole of an integrated circuit, according to which between a photosensitive coating and an insulating coating is interposed an intermediate anti-reflecting coating made e.g. from SiO.sub.2 or amorphous silicon. The SiO.sub.2 intermediate coating, etched after irradiation of the photosensitive material coating, is used as a mask for reactive ionic etching of the insulating coating. Thus, the image of the photosensitive material coating is transferred to the thick insulating material coating. This process is useful especially in the production of integrated circuits.

REFERENCES:
patent: 4076860 (1978-02-01), Kuroda
patent: 4244799 (1981-01-01), Fraser et al.
patent: 4288283 (1981-09-01), Umezaki et al.
patent: 4473437 (1984-09-01), Higashikawa et al.
patent: 4478679 (1984-10-01), Chang et al.
IBM Technical Disclosure Bulletin, vol. 13, No. 1, Jun. 1970, p. 38, Anti-Interference Phenomena Coating, H. A. Khoury et al.

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