Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1979-06-11
1981-04-28
Louie, Jr., Won H.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430324, 430394, 430396, G03C 500
Patent
active
042647142
ABSTRACT:
A process for the manufacture of precision flat parts such as masks, templates, and the like having very small openings therein with high contour details yet with substantial material thickness utilizes a metallized glass carrier having a stencil etched thereon with a negative working photo resist laminated on it. Exposure of photo resist is achieved through the glass so that maximum intensity of light in the photo resist occurs at the juncture between the photo resist and the glass carrier for maximum adhesion. Irregularly shaped apertures can be generated by selective varied orientation of the glass carrier during the exposure.
REFERENCES:
patent: 2559389 (1951-07-01), Beeber et al.
patent: 3507654 (1970-04-01), Wrench
patent: 4115120 (1978-09-01), Dyer et al.
Louie, Jr. Won H.
Siemens Aktiengesellschaft
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