Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1994-05-23
1995-10-31
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
4174131, F04B 4300
Patent
active
054628393
ABSTRACT:
This process consists of machining a silicon piece (4) by means of selective oxidation operations and photolithography to form therein at least one cavity (7, 12) adapted to contain or convey a fluid, and of oxidizing the wall of the cavity to make this hydrophilic. The device is completed by fixing closing plates (1, 5) to its body thus formed. Prior to the machining operations the surfaces of the piece (4) adapted to be in contact with the closing plates (1, 5) are covered with a screening layer that resists these machining operations. Then, after these have been completed, the surfaces of the piece intended to be exposed to the fluid are oxidized to form therein an oxide layer favoring the wettability of these surfaces. The screening layer is then removed and the closing plates are fixed to the piece.
The invention has applications, notably in micropumps.
REFERENCES:
patent: 4938742 (1990-07-01), Smits
patent: 5171132 (1992-12-01), Miyazaki et al.
patent: 5219278 (1993-06-01), Van Lintel
patent: 5259737 (1993-11-01), Kamisuki et al.
Abstract of JP 59-29461, "Manufacture of Semiconductor Device", Ueda (Feb. 1984).
Sensors and Actuators, vol. 20, No. 1/2, Nov. 1, 1989, Lausanne CH, pp. 163-169.
Sensors and Actuators, vol. 32, No. 1/3, Apr. 1, 1992, Lausanne CH, pp. 335-339.
de Rooij Nicolaas Frans
Gass Volker
Jeanneret Sylvain
van der Schoot Bart
McPherson John A.
Schilling Richard L.
Universite De Neuchatel
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