Coating processes – Measuring – testing – or indicating
Patent
1988-05-25
1990-01-30
Pianalto, Bernard D.
Coating processes
Measuring, testing, or indicating
427 39, 427 451, 427346, B05D 306
Patent
active
048972819
ABSTRACT:
According to the present invention, there is provided an improved process for the formation of a deposited film by way of a microwave plasma CVD method, the improvement comprising monitoring an effective power of a microwave to be introduced into a reaction chamber, leading to a control means an output signal indicative of the effective power corresponding a plasma intensity, and automatically controlling the matching between the reaction chamber and the microwave to be introduced into the reaction chamber according to an output signal from the control means. According to the above process, even after a long discharge time has elapsed, the plasma intensity in the reaction chamber may be maintained constant, and the effective power of the microwave to be introduced into the reaction chamber may be therefore maintained constant. Because of this, it becomes possible to repeatedly and stably prepare a desired deposited film excelling in the uniformity of the thickness and that of the quality at a high deposition rate.
REFERENCES:
patent: 4619729 (1986-10-01), Johncock et al.
patent: 4637938 (1987-01-01), Lee et al.
patent: 4667076 (1987-05-01), Amada
Arai Takayoshi
Hashizume Junichiro
Iida Shigehira
Saitoh Keishi
Takei Tetsuya
Canon Kabushiki Kaisha
Pianalto Bernard D.
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