Process for the decontamination of microlithographic...

Details Process for the decontamination of microlithographic... Process for the decontamination of microlithographic...

2005-08-30

2005-08-30

Lee, John R. (Department: 2881)

Radiant energy

Fluent material containment, support or transfer means

With cleaning means

C250S43200R, C250S428000

Reexamination Certificate

active

06936825

ABSTRACT:
UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.

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