Process for the chemical vapor deposition of oxidic particles

Details Process for the chemical vapor deposition of oxidic particles Process for the chemical vapor deposition of oxidic particles

1984-05-07

1985-09-03

Lusignan, Michael R.

Coating processes

Electrical product produced

Welding electrode

65 312, 427163, 427237, 427166, B05D 306, C03B 3707, C03B 37075

Patent

active

045392218

ABSTRACT:
A process for the chemical vapor deposition of oxidic particles by oxidat of halides or halide mixtures wherein dinitrogen monoxide is used as the oxidizing agent. The reaction is carried out at comparatively low temperatures of between 900.degree. and 1150.degree. C., but results in high yields.

REFERENCES:
patent: 4177645 (1979-12-01), Schwarz
patent: 4334903 (1982-06-01), MacChesney et al.

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