Process for self-alignment and planarization of semiconductor ch

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

437212, 437216, 437222, 257779, 257783, H01L 2152, H01L 2156, H01L 21603

Patent

active

053526295

ABSTRACT:
A method for attaching a chip to a substrate includes providing the substrate with an outer layer of an electrical conductor which is not wettable by solder and which has a window exposing an inner layer of electrical conductor that is wettable by solder. A solder preform is placed on the window exposing the inner layer, and the chip is placed on the solder preform. The substrate is then heated so as to melt the solder preform. To achieve planarity, the substrate is be positioned in a pressurizing chamber with a film overlay having higher pressure above the film overlay than underneath the overlay, and heated above the melting point of the solder.

REFERENCES:
patent: 3401126 (1968-09-01), Miller et al.
patent: 3424040 (1969-02-01), Miller et al.
patent: 3869787 (1975-03-01), Umbaugh
patent: 3887760 (1975-06-01), Krieger et al.
patent: 3919709 (1975-11-01), Koenig
patent: 4783695 (1988-11-01), Eichelberger et al.
patent: 4810671 (1989-03-01), Bhattacharyya et al.
patent: 4933042 (1990-06-01), Eichelberger et al.
patent: 5037778 (1991-08-01), Stark et al.
patent: 5043296 (1991-08-01), Hacke et al.
patent: 5051811 (1991-09-01), Williams et al.
patent: 5101550 (1992-04-01), Dunaway et al.
patent: 5181648 (1993-01-01), Leicht
"Polyimide Preform for Polyimide Film Chip Carrier", Research Disclosure No. 283, Nov. 1987, Kenneth Mason Publications Ltd., England.
"Alignment Fixture for MCM Assembly", Research Disclosure No. 332, Dec. 1991, Kenneth Mason Publications Ltd., England.
Microelectronic Packaging Handbook, Edited by R. Tummala, et al 1989, Van Nostrand Reinhold, pp. 366-447.
Electronic Packaging and Interconnection Handbook by C. A. Harper, 1991, McGraw-Hill, Inc., p. 7.21.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for self-alignment and planarization of semiconductor ch does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for self-alignment and planarization of semiconductor ch, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for self-alignment and planarization of semiconductor ch will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-581055

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.