Process for removing excess water from active chlorine compounds

Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor

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Details

219 1055R, 219 1055M, 2041571R, F26B 334

Patent

active

042479886

ABSTRACT:
Excess water, both crystalline and non-crystalline, is removed safely and rapidly from active chlorine compounds by applying electromagnetic energy with frequencies lower than infrared to vaporize the excess water.

REFERENCES:
patent: 2615259 (1952-10-01), Wade
patent: 2802793 (1957-08-01), Coetzer et al.
patent: 2859534 (1958-11-01), Copson
patent: 2949677 (1960-08-01), Cameron
patent: 2969360 (1961-01-01), Westfall
patent: 3048928 (1962-08-01), Copson et al.
patent: 3270017 (1966-08-01), Kovalsky et al.
patent: 3299060 (1967-01-01), Kovalsky et al.
patent: 3307010 (1967-02-01), Puschner
patent: 3668204 (1972-06-01), Mesiah
patent: 3712891 (1973-01-01), Berkowitz et al.
patent: 3803144 (1974-04-01), Berkowitz
patent: 3818004 (1974-06-01), Berkowitz
patent: 3834038 (1974-09-01), Janda
patent: 3843861 (1974-10-01), Van Amsterdam
patent: 3858329 (1975-01-01), Koide et al.
patent: 3859493 (1975-01-01), Peterson
patent: 3872603 (1975-03-01), Williams et al.
patent: 4023279 (1977-05-01), Janda
patent: 4045638 (1977-08-01), Chiang et al.
patent: 4045639 (1977-08-01), Meisel

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