Process for removing contaminant

Details Process for removing contaminant Process for removing contaminant

1986-04-08

1987-03-31

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 134 221, 156644, 156646, 156651, 156655, 1566591, 156668, 156902, B44C 122, B29C 3700, C03C 1500, C03C 2506

Patent

active

046541152

ABSTRACT:
Contaminant is removed from holes by etching in a gaseous plasma by first removing contaminant from the vicinity of the edges of the hole. Next, a mask is provided in the vicinity of the edges to prevent etching by contacting with a gaseous plasma which is different from the gaseous plasma employed in the first etching step. The holes are then etched in a gaseous plasma to remove contaminant from the interior of the holes in the vicinity of the center of the holes, whereby the mask protects the edges from being etched.

REFERENCES:
patent: 4328081 (1982-05-01), Fazlin
patent: 4351697 (1982-09-01), Shanefield et al.
patent: 4496420 (1985-01-01), Frohlich et al.
patent: 4582564 (1986-04-01), Shanefield et al.
patent: 4599134 (1986-07-01), Babu et al.

Affiliated with

Also associated with

Rating

Process for removing contaminant does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for removing contaminant, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing contaminant will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2211538