Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2005-10-11
2005-10-11
Hassanzadeh, P. (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C134S003000
Reexamination Certificate
active
06953533
ABSTRACT:
A method for removing a chromide coating from the surface of a substrate is described. The coating is treated with a composition which includes an acid having the formula HxAF6, where “A” can be Si, Ge, Ti, Zr, Al, or Ga; and x is 1–6. An exemplary acid is hexafluorosilicic acid. The composition may also include a second acid, such as phosphoric acid or nitric acid. In some instances, a third acid is employed, such as hydrochloric acid. A related repair method for replacing a worn or damaged chromide coating is described. The coating is often applied to portions of turbine engine components made from superalloy materials.
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U.S. Appl. No. 09/591,531, filed Jul. 9, 2000, James A. Ruud et al.
Carr David
Hattori Kazuharu
Ishida Minoru
Kool Lawrence Bernard
Potter Kenneth Burrell
Agosti Ann M.
Culbert Roberts
Hassanzadeh P.
Patnode Patrick K.
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