Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Treating polymer containing material or treating a solid...
Reexamination Certificate
2007-10-02
2007-10-02
Boykin, Terressa (Department: 1711)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Treating polymer containing material or treating a solid...
C430S270100, C558S430000, C560S224000
Reexamination Certificate
active
10544324
ABSTRACT:
A process for refining a crude resin for a resist which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The refining process for the crude resin of resist resin (A) used in a photoresist composition includes at least the resist resin (A) and an acid generator (B) dissolved in a first organic solvent (C1), such that if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution including the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.
REFERENCES:
patent: 2001/0010890 (2001-08-01), Hatakeyama et al.
patent: 2001/0026901 (2001-10-01), Maeda et al.
patent: 06/289614 (1994-10-01), None
patent: 2002-201232 (2002-07-01), None
patent: WO 2004/069959 (2004-08-01), None
Atsuchi Kota
Hada Hideo
Iwai Takeshi
Miyairi Miwa
Muroi Masaaki
Boykin Terressa
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
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