Process for refining crude resin for resist

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Treating polymer containing material or treating a solid...

Reexamination Certificate

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C430S270100, C558S430000, C560S224000

Reexamination Certificate

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10544324

ABSTRACT:
A process for refining a crude resin for a resist which is capable of effectively removing by-products such as polymers and oligomers contained within the crude resin. The refining process for the crude resin of resist resin (A) used in a photoresist composition includes at least the resist resin (A) and an acid generator (B) dissolved in a first organic solvent (C1), such that if the concentration of the component (A) in the photoresist composition is labeled X, and the crude resin concentration of the component (A) in a crude resin solution including the crude resin of the component (A) dissolved in a second organic solvent (C2) is labeled Y, then (i) the crude resin solution is prepared so that Y is smaller than X, and (ii) the crude resin solution is subsequently filtered.

REFERENCES:
patent: 2001/0010890 (2001-08-01), Hatakeyama et al.
patent: 2001/0026901 (2001-10-01), Maeda et al.
patent: 06/289614 (1994-10-01), None
patent: 2002-201232 (2002-07-01), None
patent: WO 2004/069959 (2004-08-01), None

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