Process for reducing halogen concentration in a material layer d

Details Process for reducing halogen concentration in a material layer d Process for reducing halogen concentration in a material layer d

1995-08-31

1998-11-03

Bowers, Jr., Charles L.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

Insulated gate formation

438476, 148DIG60, 148DIG147, H01L 21311

Patent

active

058308024

ABSTRACT:
A process for reducing halogen concentration in a material layer (56) includes the deposition of a dielectric layer (58) overlying the material layer (56). An annealing process is carried out to diffuse halogen atoms from the material layer (56) into the overlying dielectric layer (58). Once the diffusion process is complete, the dielectric layer (58) is removed.

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