Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1990-05-17
1992-05-26
Niebling, John
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419229, 20429803, C23C 1436
Patent
active
051164795
ABSTRACT:
A process and apparatus for producing an In-O or In-Sn-O based transparent conductive film by a sputtering process is provided. The sputtering voltage is kept constant at 350V or less by maintaining the intensity of the magnetic field on the surface of the target at 400 Oe or greater. The apparatus contains a vacuum chamber wherein the substrate and target are mounted in opposite to each other. An electromagnet, used for adjusting the intensity of the magnetic field is located on the rear surface of the target. Additionally provided is a controller for the electric current supplied to the electromagnet. The controller is also connected to a DC power supply for the electromagnet.
REFERENCES:
patent: 4428809 (1984-01-01), Heimbach et al.
patent: 4500408 (1985-02-01), Boys et al.
patent: 4500409 (1985-02-01), Boys et al.
Brian Chapman, Glow Discharge Processes, John Wiley & Sons, New York, 1980, pp. 260-270.
Patent Abstracts of Japan, vol. 9, No. 112 (C-281)[1835], May 16, 1985; JP-A-60 5878 (Nippon Shinku Gijutsu K.K) Jan. 12, 1985.
Higuchi Yasushi
Ishibashi Satoru
Nakamura Kyuzo
Ota Yoshifumi
Leader William T.
Niebling John
Nihon Shinku Gijutsu Kabushiki Kaisha
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