Process for producing transparent carbon nitride films

Details Process for producing transparent carbon nitride films Process for producing transparent carbon nitride films

1996-06-28

1997-04-08

Turner, Archene

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041921, 20419211, 20419212, 20419226, C23C 1434

Patent

active

056183895

ABSTRACT:
The present invention provides transparent carbon nitride films, processes or making them and compositions of matter comprising them. The films are made using a magnetron sputter gun and a ion beam. Low pressure and high velocity atoms and ions are an important part of the present invention.

REFERENCES:
patent: 4664976 (1987-05-01), Kimura et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 5110679 (1992-05-01), Haller et al.
patent: 5156725 (1992-10-01), Doktycz et al.
patent: 5225057 (1993-07-01), LeFebvre et al.
patent: 5232570 (1993-08-01), Haines et al.
patent: 5405515 (1995-04-01), Fang

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