Process for producing thin film

Details Process for producing thin film Process for producing thin film

1997-01-14

2000-05-02

Nelms, David

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438662, 438795, 438798, 438478, 427553, 427565, 427596, H01L 2144

Patent

active

060572337

ABSTRACT:
To produce a high quality thin film by effectively removing the particles from the emitted substance and the oxygen retained under a high vacuum during the production of the thin film by laser ablation, there is provided a process for producing a thin film on a substrate by laser ablation in a vacuum chamber in which a laser beam is irradiated to a target to cause emission of a substance from the target and allowing the emitted substance to deposit on the substrate to grow a thin film on the substrate by laser ablation, the process including irradiating an ion beam to at least one of the substrate and a plume of the emitted substance formed between the substrate and the target.

REFERENCES:
patent: 5406906 (1995-04-01), Rimai et al.
patent: 5490912 (1996-02-01), Warner et al.
patent: 5650377 (1997-07-01), Kern et al.
patent: 5689428 (1997-11-01), Sauerbrey et al.
patent: 5731046 (1998-03-01), Mistry et al.

Affiliated with

Also associated with

Rating

Process for producing thin film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for producing thin film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for producing thin film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1593551